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Electronic Grade Carbon Tetrafluoride CF4 99.999%

Electronic Grade Carbon Tetrafluoride CF4 99.999% is the most widely used plasma etching gas in the microelectronics industry. It is widely used in etching thin film materials such as silicon, silicon dioxide, silicon nitride, phosphorus silicon glass and tungsten. It is also widely use......

Release time：2025-04-26

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Electronic Grade Carbon Tetrafluoride CF4 99.999% is the most widely used plasma etching gas in the microelectronics industry. It is widely used in etching thin film materials such as silicon, silicon dioxide, silicon nitride, phosphorus silicon glass and tungsten. It is also widely used in electronic device surface cleaning, solar cell production, laser technology, low temperature refrigeration, gas insulation, leakage detection agent, control of space rocket attitude, detergent, lubricant and brake fluid in printed circuit production. Due to its strong chemical stability, Electronic Grade Carbon Tetrafluoride CF4 99.999% can also be used in metal smelting and plastic industries. The characteristics and development trend of electronic gases used in today's ultra-large-scale integrated circuits are ultra-pure, ultra-clean, multi-variety and multi-specification. In order to promote the development of their own microelectronics industry, countries are paying more and more attention to the development of special electronic gas production technology. At present, carbon tetrafluoride (CF4) has long occupied the etching gas market with its relatively low price, so it has broad development potential.

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