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Carbon tetrafluoride CAS 75-73-0

Carbon tetrafluoride is the most widely used plasma candle engraving gas in the microelectronics industry. It is a mixture of high-purity gas and high-purity carbon tetrafluoride gas with high-purity oxygen....

Release time：2025-04-26

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Carbon tetrafluoride CAS 75-73-0

Product name: Carbon tetrafluoride Carbon tetrafluoride gas Tetrafluoromethane Perfluorocarbon

Product grade: Analytical grade

Product purity: 99.999%

Packaging specification: 40L

Chinese name: 四氟化碳

Chinese alias: 四氟甲烷

CAS: 75-73-0

EINECS: 200-896-5

Molecular formula: CF4

Molecular weight: 88

Physical and chemical properties: - Melting point: -184℃

Carbon tetrafluoride is the most widely used plasma candle engraving gas in the microelectronics industry. It is a mixture of high-purity gas and high-purity carbon tetrafluoride gas with high-purity oxygen.

1. It can be widely used in the candle engraving of silicon, silicon dioxide, silicon nitride, phosphorus silicon glass and tungsten thin film materials. For silicon and silicon dioxide systems, when using CF4-H2 reactive ion etching, by adjusting the ratio of the two gases, a selectivity of 45:1 can be obtained, which is very useful when etching silicon dioxide films on polysilicon gates.

2. It is also widely used in electronic device surface cleaning, solar cell production, laser technology, gas phase insulation, low-temperature refrigeration,

leakage detection agent, control of space rocket attitude, and decontamination agent in printed circuit production.

3. Due to its extremely strong chemical stability, CF4 can also be used in metal smelting and plastic industries.

4. Carbon tetrafluoride has good oxygen solubility, so it is used by scientists to replace ordinary compressed air in ultra-deep diving experiments. It has been successfully used on mice, and mice can still escape safely at a depth of 275 to 366 meters.

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