At room temperature, carbon tetrafluoride CF4 gas is a colorless, odorless, non-flammable compressible gas with high volatility. It is one of the most stable organic compounds. At 900°C, it does not react with copper, nickel, tungsten, and molybdenum, but only slowly decomposes at carbon arc temperature. It is slightly soluble in water, and its solubility is 0.0015% (weight ratio) at 25°C and 0.1Mpa. However, when it burns with combustible gases, it will decompose to produce toxic fluorides.
Carbon tetrafluoride CF4 gas is currently the most widely used plasma candle engraving gas in the microelectronics industry. Its high-purity gas and a mixture of high-purity carbon tetrafluoride gas and high-purity positive oxygen can be widely used in the candle engraving of silicon, silicon dioxide, silicon nitride, phosphorus silicon glass and tungsten thin film materials.
It is also widely used in electronic device surface cleaning, solar cell production, laser technology, gas phase insulation, low-temperature refrigeration, leak detection agent, control of space rocket attitude, and decontaminant in printed circuit production.
The company is committed to the layout of the entire fluorine chemical industry chain, and is mainly engaged in the research, development, production and sales of basic chemical materials, fluorine-containing electronic gases, semiconductor high-purity reagents, new energy materials and other series of fluorine-containing new materials. The products are widely used in semiconductor chips, LED chips, flat panel displays, communication optical fibers, power and energy storage batteries, ultra-high voltage transmission and transformation, photovoltaic power generation, etc.
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